Conemist | D Series
Conemist of ultrasonic spray nozzle is an ultrasonic atomizing nozzle with a cyclonic cone spray. The ultrasonic atomizing nozzle technology adopts a special vortex flow channel design to transform the carrier gas into a uniform rotating airflow, so that the liquid mist after ultrasonic atomization is scattered and spurted in the form of a cyclone, as enlarges the spraying area of the ultrasonic spray nozzle. It is also possible to spray on angled substrates such as vertical or curved surfaces.
A typical application of a Conemist ultrasonic spray nozzle is photoresist coating of a semiconductor wafer, which is to spray coating the photoresist onto a semiconductor wafer. Since the mist sprayed by Conemist ultrasonic spray nozzle is rotationally scattered, not only the photoresist film can be uniformly formed on the plane of the wafer, but also a uniform package can be formed on the sidewalls and the corners of the wafer microstructure photoresist film. In addition, Conemist ultrasonic nozzle can also be applied to, for example, thin film solar cell spray coating, perovskite solar cell spray coating, AR anti-reflective layer spray coating, thermal film spray coating, super hydrophobic spray coating, PCB flux spray coating, etc.
Uniform coating: uniformity >95%
Saving raw materials: raw material utilization rate is over 85%, 4 times that of traditional air spray nozzle
High control accuracy of coating thickness : 20 nm to tens of micron coatings can be precisely sprayed.
Electronics: Photoresists onto Wafer etc.
Industrial: Glass, Fabrics, etc.
Medical: Medical Textile, Diagnostic Device etc.
Energy: Fuel Cell, Solar Cell, etc.
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