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Megasonic Cleaning

Using higher ultrasonic frequency energy with accelerrated water molecules,submicron level cleaning is possible, without damaging sensitive microelectronic and seminconductor device.

Megasonic Cleaning, High-frequency Ultrasonic Cleaning, Semiconductor Wafer Cleaning

Megasonic Cleaning Nozzle

Using higher ultrasonic frequency energy with accelerrated water molecules,submicron level cleaning is possible, without damaging sensitive microelectronic and seminconductor device.

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