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Megasonic Cleaning Nozzle

Using higher ultrasonic frequency energy with accelerated water molecules, submicron level cleaning is possible, without damaging sensitive microelectronic and semiconductor device.


Features

  • Cleaning of liquid crystal displays(LCDs),

  • Flat paneldisplays(FPDs),sillicon(or GaAs,sapphire,etc.) 

  • Wafers(post-CMP,prediffusion,etc.),

  • Photomasks,

  • Reticules and numerous other applications where submicron particle removal is required.

  • There is no worry of the re-adhesion of dirt in the liquid to always to supply a cleancleaning solution.

  • Minute dirt is instaneously removed for the high frequency oscillation.

  • It is possible to wash it at ease by the output adjustment even by the one like the magnetic head that cracks easily.


Options

Notes

Applications

Related Products

Why Choosing Us

Fast Delivery

We provide shorter lead time and faster shipping for customers all over the world.

Professional Service

Over 30 years experience guarantee that we can provide very professional service to every customers.

Best Price

We not only provide high quality products but also provide very competitive price.

Demonstration

A sample video demonstrates the application of products and technologies.